How to Apply
We participate in the application process through the Electronic Residency Application System (ERAS), and the annual match each spring through the National Resident Matching Program (NRMP). The application deadline is October 23; however, it is strongly recommended that candidates submit the application early. We offer one position per year at the PGY-1 level.
Applicants are selected for interview based on academic performance, accomplishments, intelligence, motivation, interpersonal skill, and character. Some of the factors used to assess each applicant include:
- USMLE scores
- Medical school performance
- A minimum of three letters of recommendation: One from the applicant's medical school chair of neurosurgery, and at least two other attending neurosurgeons
- Extracurricular interests
In 2020 we are switching to a virtual interview process due to the COVID-19 pandemic. Applications will be reviewed in October and November with the most qualified applications being invited to interview. We will be holding two interview days, one in December and one in January.
Candidates are ultimately ranked based on their overall fit for the program. In addition to clinical potential and scholastic motivation, it is essential that residents in this program have excellent interpersonal skills, along with an ability to collaborate in small groups.
Match Communication Code of Conduct
We follow the NRMP guidelines for the Match process. We will not contact you but are happy to hear from you and to answer questions you may have that are not answered during the application and interview process.
Benefits and policies
For an overview of benefits available to residents, please visit the Resident/Fellow Benefits page.
The Resident and Fellow Policy and Procedure Manual outlines all basic institutional regulations governing residency and fellowship positions within Dartmouth-Hitchcock and is considered part of the Resident/Fellow Agreement of Appointment.
Please read the following important GME policies before your interview: